Plasma-enhanced deposition
PECVD tubular furnace for low-temperature high-quality film deposition using quartz tube, uniform heating and plasma process integration.
PECVD Tubular Furnace is offered as a configurable industrial furnace system. Share your material, working temperature, chamber size, atmosphere, loading weight and output target so the engineering team can confirm the suitable configuration.
Confirm gas lines, plasma requirement, tube diameter, process temperature and pump specification.
Send material, target temperature, chamber size, batch weight, vacuum or gas atmosphere, heating rate, cooling method and destination country. The engineering team can then recommend the right chamber, hot zone, loading method and budget range.